The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 1999

Filed:

Nov. 21, 1996
Applicant:
Inventors:

Nai Huai Liu, Hsin-Chu, TW;

Kuo Liang Lu, Hsin-Chu, TW;

B J Chang, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
156345 ; 1341001 ; 134902 ; 222195 ; 239418 ; 239566 ; 216 92 ; 438748 ;
Abstract

A wet chemical process tank for processing semiconductor wafers equipped with a specially designed fluid dispenser positioned at the bottom of the tank where the dispenser has a fluid dispensing member having an elongated body connected on at least one end to at least one support member for stabilizing the member and a fluid passage therein in fluid communication with a plurality of openings provided on at least one of the vertical sides of the member such that a fluid may only exit the member in a horizontal direction so that bubbles generated do not directly contact the semiconductor wafers suspended at the center of the tank.


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