The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1999
Filed:
Dec. 09, 1996
Yung-Dar Chen, Hsin-Chu Hsien, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Defects, associated with the presence of microbubbles in the photoresist developer solution, have been largely eliminated by providing an apparatus and method whereby the photoresist developer solution, while on standby status in a buffer tank, is maintained at a negative pressure (about minus 0.5 kg/cm.sup.2). This allows any microbubbles, that were introduced into the solution during the course of conveying it to the buffer, to escape. The negative pressure in the buffer during its refill and standby stages is generated by adding a venturi valve to the existing equipment. This keeps the impact on the control software to a minimum and has little or no effect on the cost of the process.