The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1999
Filed:
Oct. 25, 1996
Applicant:
Inventor:
Allen Flanigan, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429811 ; 118720 ; 118721 ; 118504 ; 118505 ; 427282 ;
Abstract
A method and apparatus for fabricating a wafer spacing mask on a workpiece support chuck. Such apparatus is a plate containing a plurality of apertures that is positioned atop the workpiece support chuck while material is deposited onto the plate and through the apertures onto chuck. Upon completion of the deposition process, the plate is removed from the workpiece support chuck leaving deposits of the material to form the wafer spacing mask.