The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 1998
Filed:
Jan. 16, 1997
Shigetaka Kumashiro, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
High-speed simulation of oxidation is performed even when an overlap occurs between oxide-film shapes. A sweeping quadrilateral is defined accompanying the growth of an oxide film from a line segment composing the surface of the oxide film before the growth, the line segment on the surface of an oxide film after the growth and the dislocation vectors of both ends in these segments. The overlap width of the oxide-film shapes is then acquired by a predetermined figure calculation of these sweeping quadrilaterals between them. A linear estimation is made on the time axis when an overlap between the oxide-film shapes occurs. The growth time of the oxide film is retrogressed so that the overlap width of said oxide-film shapes decreases below a previously specified allowable value. Thereafter, the oxidation simulation is continued with this state made into a renewed initial state.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile