The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1998
Filed:
Dec. 19, 1995
Masayuki Nishiwaki, Kawaguchi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method used in manufacturing a workpiece using a plurality of spaced apart mask patterns includes two dividing steps and two focusing steps. The first step divides a light beam emitted from a light source into a plurality of light beams on a first plane including a first axis. A second step divides each of the plurality of light beams into a plurality of light beams on a second plane perpendicular to the first plane, the second plane including a second axis perpendicular to the first axis. A third step focuses the plurality of light beams produced by the second step only in the first direction. A fourth step focuses the plurality of light beams focused in this third step in the first direction at a position beyond the plurality of mask patterns in the second direction so that the light beams focused in the third step overlap each other to perform a plurality of spaced apart images, each of which illuminate one of the plurality of spaced apart mask patterns.