The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1998
Filed:
Apr. 07, 1997
Applicant:
Inventors:
Lai-Juh Chen, Hsinchu, TW;
Hsueh-Chung Chen, Taipei, TW;
Assignee:
Industrial Technology Research Institute, Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438693 ; 438692 ; 451 21 ;
Abstract
Several quantities related to pad wear during chemical mechanical polishing have been improved by measuring the emissivity of the pad within the annulus of wear. This emissivity value is shown to relate directly to the amount of wear in the pad and is used to control the pressure on a conditioner that is employed to compensate for pad wear. By using multiple conditioners, each of which presses on the pad with a force that is related to the pad emissivity in its annulus of wear, the uniformity of material removal, both in time and space, is improved.