The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 1998

Filed:

Jan. 16, 1996
Applicant:
Inventors:

Alan E Ferry, Manchester, NH (US);

Byung Joon Han, Seoul, KR;

Maureen Yee Lau, Warren, NJ (US);

Robert T Scruton, Sr, Rye, NH (US);

King Lien Tai, Berkeley Heights, NJ (US);

Assignee:

Lucent Technologies Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; G03B / ;
U.S. Cl.
CPC ...
430313 ; 430311 ; 430319 ; 355 55 ;
Abstract

The present inventors have discovered that fine patterns of metal or insulator can be formed on printed circuit board using conventional lithographic steppers with inverted projection lenses. The inverted projection lenses act as enlargement lenses rather than reducing lenses and exhibit a large depth of focus sufficient to accommodate the deviations of PC board from planarity. The inverted lens reduces the size of the image needed at the mask, permitting multiple mask levels to be combined on a single glass. This reduces the cost of the mask set and permits the use of smaller glass masks having greater accuracy and dimensional stability than the convention mylar masks used for PC board. By inverting the projection lenses on near-obsolete steppers, applicants were able to form metal patterns on PC board of finer dimension than heretofore reported. Inverting a 5.times. ZEISS lens on a GCA 6300A stepper, applicants were able to form vias of less than 25 .mu.m diameter, pattern metal lines and spaces of less than 25 .mu.m, and obtain overlay registration accuracy of less than 25 .mu.m. The field size was larger than 1 in.sup.2, and the depth of focus was greater than 50 .mu.m.


Find Patent Forward Citations

Ferry, Alan. (1998). Method and apparatus for forming fine patterns on printed circuit board (U.S. Patent No. 5834160). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5834160

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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