The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1998
Filed:
Jun. 18, 1997
Applicant:
Inventor:
Ernest W Ellis, Harvard, MA (US);
Assignee:
Presstek, Inc., Hudson, NH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41N / ;
U.S. Cl.
CPC ...
101460 ; 101462 ; 101465 ; 101466 ; 101467 ;
Abstract
The lithographic affinity characteristics of a material, such as a polymer, are affected--and thereby selectively modulated--through implantation of one or more metallic materials, typically in the form of ions and/or atoms (or molecules). The desired characteristics are achieved by bulk chemical modification of the material rather than by texturing or deposition of a new surface layer. In the case of a polymer system, for example, the metal impregnates the matrix, penetrating to an observable depth without substantial surface accumulation.