The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1998
Filed:
Jun. 17, 1997
Ki-Chang Song, Kyungki-do, KR;
Don-Hee Lee, Kyungki-do, KR;
Young-Sam Jeon, Kyungki-do, KR;
Chil-Keun Park, Kyungki-do, KR;
LG Semicon Co., Ltd., Chungcheongbuk-do, KR;
Abstract
A method of fabricating an X-ray mask includes the steps of forming a membrane on a substrate, forming a first material on the membrane, implanting predetermined ions into the first material, planarizing the membrane by removing a part of the first material and membrane, forming an absorber on the membrane planarized and depositing a second material on the absorber, implanting predetermined ions into the second material, planarizing the absorber by removing a part of the second material and membrane, and patterning the absorber planarized to have a predetermined shape.