The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1998
Filed:
Dec. 08, 1995
Micron Technology, Inc., Boise, ID (US);
Abstract
In one aspect, a semiconductor processing method for connecting a metal layer to a plug when there is a fang gap between the plug and a layer surrounding the plug includes: a) forming a conductive material within an opening in a surrounding layer; b) etching the conductive material with a first etch chemistry to form a fang gap between the conductive material and the surrounding layer, the fang gap having a first width; c) etching the conductive material with a second etch chemistry to widen the fang gap to a second width which is greater than the first width, the second etch chemistry being different from the first etch chemistry; and d) providing an outer metal layer over the conductive plug after widening the fang gap, the metal layer at least partially filling the widened fang gap.