The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Mar. 22, 1995
Timothy N Thomas, Beaverton, OR (US);
Paul C Allen, Beaverton, OR (US);
Etec Systems, Inc., , NV (US);
Abstract
A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.