The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1998
Filed:
Aug. 29, 1995
Yoshiharu Kataoka, Utsunomiya, JP;
Tetsuya Mori, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of measuring an exposure condition for transfer of a pattern onto a photosensitive substrate or aberration of a projection optical system is disclosed, wherein the pattern is transferred onto the photosensitive substrate plural times in different exposure conditions, to form photosensitive patterns on the photosensitive substrate, and images of the photosensitive patterns are picked up. Frequency components of the photosensitive patterns are calculated from corresponding imagewise signals, and an optimum exposure condition for transfer of the pattern onto the photosensitive substrate is determined on the basis of the frequency components of the photosensitive patterns.