The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1998
Filed:
Mar. 13, 1996
Applicant:
Inventors:
Anand Gupta, San Jose, CA (US);
Srihari Ponnekanti, Santa Clara, CA (US);
Gana A Rimple, Santa Clara, CA (US);
Laxman Murugesh, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ; B08B / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
134-12 ; 134-11 ; 134-13 ; 1566431 ; 1566561 ; 1566461 ; 1566571 ; 1566591 ; 156345 ;
Abstract
A method and apparatus for protecting a susceptor during a cleaning operation by loading a ceramic wafer onto the susceptor before introducing the cleaning agent into the chamber is provided. In particular, the ceramic wafer is chosen to have a dielectric value sufficient to alter the electromagnetic field of a plasma to spread the plasma away from the susceptor during a cleaning operation, directing more of the plasma towards the walls of the chamber.