The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1998
Filed:
Apr. 23, 1996
Panayotis Constantinou Andricacos, Croton-on-Hudson, NY (US);
James Hartfiel Comfort, New City, NY (US);
Alfred Grill, White Plains, NY (US);
David Edward Kotecki, Hopewell Junction, NY (US);
Vishnubhai Vitthalbhai Patel, Yorktown, NY (US);
Katherine Lynn Saenger, Ossining, NY (US);
Alejandro Gabriel Schrott, New York, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Noble metal plating on a preexisting seed layer is used in the fabrication of electrodes for DRAM and FRAM. The plating may be spatially selective or nonselective. In the nonselective case, a blanket film is first plated and then patterned after deposition by spatially selective material removal. In the selective case, the plated deposits are either selectively grown in lithographically defined areas by a through-mask plating technique, or selectively grown as a conformal coating on the exposed regions of a preexisting electrode structure. A diamond-like carbon mask can be used in the plating process. A self-aligned process is disclosed for selectively coating insulators in a through-mask process.