The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1998
Filed:
Mar. 17, 1995
Ichiro Hagino, Kawasaki, JP;
Katsuji Tabara, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method and apparatus for inspecting patterns of reticle data includes carrying out a sizing process in which source data for designing a given device are combined with each other; carrying out a slit filling process in which any slit, that may occur in patterns obtained by the sizing process and is unconformable to a predetermined rule, is deleted by enlarging and reducing patterns; separately storing patterns obtained by the sizing process and patterns obtained by the slit filing process; carrying out a logical operation for patterns obtained by the sizing process and patterns obtained by the slit filling process; storing patterns obtained by logical operation as graphic patterns; detecting patterns each having dimensions equal to or smaller than the predetermined value on the basis of coordinates of the graphic patterns; and deeming the thus detected patterns to be false defect patterns and distinguishing false defect patterns from true defect patterns.