The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 1998

Filed:

Jan. 29, 1997
Applicant:
Inventors:

Hans-Peter Feuerbaum, Munchen, DE;

Jurgen Frosien, Riemerling, DE;

Koshi Ueda, Munich, DE;

Toshimichi Iwai, Munich, DE;

Gerald Schonecker, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ; 250310 ;
Abstract

An electrostatic-magnetic lens arrangement is for focusing charged particles as well as a charged particle beam device with such a lens arrangement which has a magnetic lens and an electrostatic lens incorporated into the magnetic lens, the magnetic lens being constructed as a single-pole lens.


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