The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1998
Filed:
Jan. 14, 1997
Applicant:
Inventors:
Junji Nishii, Kawanishi, JP;
Kohei Fukumi, Ikeda, JP;
Akiyoshi Chayahara, Ikeda, JP;
Kanenaga Fujii, Hyogo-ken, JP;
Hiroshi Yamanaka, Nara-ken, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
501 36 ; 501 54 ; 65385 ; 65392 ; 65394 ;
Abstract
A method for producing a SiO.sub.2 glass material having regions changed in light refractive index is provided which comprises implanting at least 5.times.10.sup.19 Ge ions/cm.sup.3 into a SiO.sub.2 glass substrate, heat-treating the substrate at a temperature exceeding 300.degree. C., and exposing the substrate to an ultraviolet light. Also provided is a SiO.sub.2 glass material produced by the method.