The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1998
Filed:
Jul. 31, 1995
Kazuyoshi Manako, Saga, JP;
Sumitomo Sitix Corporation, Hyogo-ken, JP;
Abstract
A semiconductor wafer cleaning liquid includes an aqueous hydrogen fluoride (HF) solution having a HF concentration between 0.03% and 0.05% by weight, which is adjusted to 20.degree. C. or below and into which ozone is directly dissolved up to a saturation point. A method for cleaning semiconductor wafers incudes the steps of charging an aqueous HF solution adjusted to 20.degree. C. or below and having an HF concentration between 0.03% and 0.05% by weight into a treatment bath; dissolving ozone into the aqueous solution up to a saturation point to prepare a cleaning liquid; dipping to etch semiconductor substrate into the cleaning liquid in the treatment bath; and rinsing the semiconductor substrate with pure or ozone-dissolved water in a bath separate from the treatment bath.