The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1998
Filed:
Mar. 22, 1995
Paul C Allen, Beaverton, OR (US);
Etec Systems, Inc., Beaverton, OR (US);
Abstract
A small field scanning photolithography system has a double pass Wynne-Dyson optical system which provides an erect, non-reverted, unmagnified image. An optical path through the system passes from an object, reflects off an input reflector, passes through a first quadrant of a lens, reflects off a concave mirror, passes through a second quadrant of the lens into folding optics where an intermediate image forms, passes from the folding optics through a third quadrant of the lens, reflects off the concave mirror a second time, passes through a fourth quadrant of the lens, and finally reflects off an output reflector to a plane where a final image forms. Typically, the input and output reflectors and the folding optics are prisms. A field stop may be provided in the folding optics where the intermediate image forms. Magnification adjusting optics can be added to the input and output prisms or to the folding optics. The magnification adjusting optics forms two narrow meniscus air gaps which are equal size for unity magnification. Narrowing one air gap and widening the other air gap changes magnification slightly.