The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1998
Filed:
Oct. 25, 1995
Applicant:
Inventor:
Chung J Lee, Austin, TX (US);
Assignee:
Tamarack Storage Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08L / ;
U.S. Cl.
CPC ...
528353 ; 528170 ; 528172 ; 528173 ; 528174 ; 528179 ; 528188 ; 528220 ; 528229 ; 528310 ; 528322 ; 528350 ; 524600 ; 524606 ; 522 65 ; 522 78 ; 522176 ; 430270 ; 430286 ;
Abstract
Photosensitive polyimides (Ps-PIM) materials have been synthesized that belong to three families of Ps-PIM materials. Through the use of precursors, various catalytic compositions with differing photosensitivities are provided. The results are Ps-PIM materials having increased photosensitivities at wavelengths longer than approximately 330 to 350 nm and an associated catalytic system that is insensitive to oxygen. A variety of applications, including use in holographic systems, are improved by the present invention.