The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1998
Filed:
Jun. 14, 1996
Applicant:
Inventors:
Timothy R Groves, Poughkeepsie, NY (US);
Juan R Maldonado, Chappaqua, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 378 34 ; 378 35 ;
Abstract
X-ray lithography is used in the fabrication of very large scale integrated circuits. Optical lithography techniques are used to create a preliminary mask with coarse features in the preparation of a high resolution x-ray mask. The E-beam tool may register the location of the E-beam relative to the optically written coarse features. This helps the tool to navigate according to the location of specific features.