The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1998
Filed:
Aug. 04, 1995
Abbas El Gamal, Palo Alto, CA (US);
David P Marple, Palo Alto, CA (US);
Justin M Reyneri, Los Altos, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Using the present invention, only a single design and development process needs to be conducted for ICs fabricated using a number of different fabrication processes. In one embodiment of this process, the IC is first designed on a CAD system using a generic Cell Based Architecture (CBA) library. This generic CBA library represents several libraries for different process technologies. The resulting generic design is then simulated and verified using best and worst case timing delays and other parameters which are derived from a combination of the various technologies. Hence, only one design need be created and simulated. Generic design rule and parasitic parameters are then used to optimize the placement and routing of the generic design. The post-layout generic design is then simulated and verified using performance characteristics determined by a combination of the technologies. The accepted, generic post-layout design is then ported for each intended fabrication process to create the mask patterns associated with each fabrication process.