The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1998
Filed:
Jun. 02, 1995
Noriyuki Nose, Atsugi, JP;
Minoru Yoshii, Higashinakano, JP;
Kenji Saitoh, Yokohama, JP;
Hiroshi Osawa, Yokohama, JP;
Koichi Sentoku, Atsugi, JP;
Toshihiko Tsuji, Atsugi, JP;
Takahiro Matsumoto, Atsugi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.