The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1998
Filed:
Nov. 16, 1995
Yves Painchaud, Quebec, CA;
Pierre Langlois, Ste-Catherine-de-la Jacques-Cartier, CA;
Pierre Galarneau, Cap-Rouge, CA;
Alain Chandonnet, Cap-Rouge, CA;
Jocelyn Lauzon, St-Augustin-de-Desmaures, CA;
Institut National D'Optique, Sainte-Foy, CA;
Abstract
A method for spatially controlling the period and amplitude of Bragg filters in an optical medium having a longitudinal axis that is sensitive to at least some wavelength of electromagnetic radiation. A phase mask of period .LAMBDA. is laid close to the optical medium at an angle .alpha. with respect to the longitudinal axis of the optical medium. A single beam of electromagnetic radiation is directed at an incidence angle .phi. with respect to normal incidence on the phase mask so that the radiation is diffracted, resulting in an interference pattern having a period P impinged into the optical medium so that the period P of the interference pattern may be altered by changing the incidence angle .phi. or the angle .alpha. . This method is simpler, more flexible and more suitable for mass production than existing methods.