The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1998

Filed:

Jul. 10, 1996
Applicant:
Inventors:

Dorian Heimanson, Rochester, NY (US);

Mehrdad M Moslehi, Los Altos, CA (US);

Paul E Spronz, Rochester, NY (US);

Thomas R Omstead, Austin, TX (US);

Assignee:

CVC Products, Inc., Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2042982 ;
Abstract

A high magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition includes a magnetron array with a plurality of magnet assemblies disposed proximate to a target. Each assembly comprises a first portion magnetized perpendicularly to the target, a second portion magnetized perpendicularly to the target and opposite the first portion, and a third portion positioned intermediate the first and second portions, the third portion magnetized parallel to the target.


Find Patent Forward Citations

Heimanson, Dorian. (1998). High magnetic flux permanent magnet array apparatus and method for high (U.S. Patent No. 5746897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5746897

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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