The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1998
Filed:
Sep. 29, 1995
Yoh Han Pao, Cleveland Heights, OH (US);
AI Ware, Inc., Beachwood, OH (US);
Abstract
The subject system provides a self-organized reduced-dimension remapping of pattern data. The system functions to a mapping from an original pattern space to a reduced-dimension space in an unsupervised nonlinear manner, but with a constraint that the overall variance in a representation of the data be conserved. This approach relates to but is different from both the Karhuren-Loeve (K-L) transform and auto-associative approaches which emphasize feature extraction, and also from the Advanced Reasoning Tool (ART) and feature mapping approaches which emphasize category formation based on similarity in the original representation. The subject system is highly efficient computationally. The reduced-dimension representation is suitably further simplified with ART or feature mapping techniques, as appropriate and as desired.