The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1998
Filed:
Oct. 02, 1995
Brian Catanzaro, San Diego, CA (US);
Adlai H Smith, San Diego, CA (US);
Litel Instruments, San Diego, CA (US);
Abstract
A technique is described which provides for directly placing multiple patterns on a nonconducting substrate using an electron beam. Prior to patterning, a conductive coating is applied to the nonconductive substrate. The patterns are generated by controlling the position and the speed of movement of the electron beam. Each pattern contains fiducials lying outside of the pattern's active region. After a conductive layer has been exposed, the patterned regions are removed, typically through etching. A separate etch is used to etch the pattern into substrate. The unpatterned portions of the conductive coating are then removed and a new conductive coating is applied to the substrate, insuring that the fiducials are protected during the removal procedure so that they can be used to align subsequent patterns. This procedure is repeated as many times as necessary to form the desired number of patterns in the substrate. This procedure is directly applicable to the generation of computer-generated holograms, specifically diffractive optics. This technique can also be used to generate phase-shifted lithographic mask.