The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1998
Filed:
May. 23, 1997
Applicant:
Inventors:
David James Eaglesham, Hudson, NJ (US);
Hans-Joachim Ludwig Gossmann, Union, NJ (US);
John Milo Poate, Union, NJ (US);
Peter Adriaan Stolk, Morris, NJ (US);
Assignee:
Lucent Technologies Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257607 ; 257 65 ; 437 80 ;
Abstract
Diffusion of ion-implanted dopant is controlled by incorporating electrically inactive impurity in a semiconductor layer by at least one crystal growth technique.
Quick Actions:
Eaglesham, David. (1998). Process for controlling dopant diffusion in a semiconductor layer and (U.S. Patent No. 5731626). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5731626
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile