The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Aug. 24, 1994
Thomas Joseph Banholzer, San Jose, CA (US);
Dan Marohl, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chamber for processing a semiconductor wafer, in which the chamber houses a domed pedestal for supporting the wafer inside the chamber and a clamp ring having a seat formed therein. The seat receives and holds down the periphery of the wafer onto the domed pedestal and includes a wafer engaging surface which engages and holds down the periphery of the wafer. In use the wafer engaging surface defines an angle to the horizontal which is greater than or equal to the angle to the horizontal defined by a tangent to the domed pedestal at the point where the periphery of the wafer is held down onto the pedestal. Typically the angle to the horizontal defined by the seat is about 3.degree. greater than the angle of the tangent to the domed pedestal at the point where the wafer is held down onto the pedestal.