The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Nov. 27, 1996
Denis G Fauteux, Acton, MA (US);
Martin Van Buren, Chelmsford, MA (US);
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
The present invention is directed to an electrode mask for use in an electrolytic cell, and an associated process for fabricating such a cell with an electrode mask. The electrode mask is applied to a limited portion of the active material of at least one of the first and second electrodes so that the peripheral edge of the electrode mask and associated electrodes are in planer relationship with each other. In addition, the electrode mask can be applied in a manner which enables a fully fabricated electrolytic cell to be manufactured with any desired geometric configuration, merely by altering the electrode mask application pattern, and a die-cutter to cut an assembled cell in conformance with the applied pattern of the electrode mask.