The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 1997
Filed:
Mar. 18, 1996
Donald M Kenney, Shelburne, VT (US);
Other;
Abstract
An integrated structure is provided that includes a DRAM cell with a trench storage capacitor, and a corresponding storage node precharge circuit. The entire structure ideally requires only eight square features of area per memory bit. The structure also provides a partial leakage current shield for the DRAM storage node diffusion, thereby improving the data hold time. A graded impurity region around the storage node diffusion enhances the leakage shielding effect. The structure can be operated independently as a DRAM leakage shield if the precharge circuit is not needed. In that case, a junction diffusion in the structure can be eliminated and a leakage shielding effect is still achieved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile