The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 1997

Filed:

Jun. 07, 1995
Applicant:
Inventors:

Michael C Smayling, Missouri City, TX (US);

David A Baglee, Albuquerque, NM (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 41 ; 437979 ; 437983 ;
Abstract

A transistor having reduced hot carrier implantation is disclosed which is formed on an outer surface (12) of a semiconductor substrate (10). The transistor comprises a source region (22) and a drain region (24) which define there between a channel region (34). A gate insulator layer (14) insulates a gate conductor (16) from the channel region (34). A sidewall insulator body (20) is formed such that a thickened region of insulator separates an end of gate conductor (16) from a portion of channel region (34) proximate drain region (24). This thickened insulator reduces the local electric field in channel region (34) near drain region (24) and correspondingly reduces the implantation into gate insulator (14) of hot carriers generated from impact ionization.


Find Patent Forward Citations

Smayling, Michael. (1997). Transistor having reduced hot carrier implantation (U.S. Patent No. 5681768). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5681768

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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