The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 1997
Filed:
Dec. 04, 1995
Applicant:
Inventors:
Youichi Ohsawa, Nakakubiki-gun, JP;
Satoshi Watanabe, Nakakubiki-gun, JP;
Katsuyuki Oikawa, Nakakubiki-gun, JP;
Akinobu Tanaka, Fujisawa, JP;
Yoshio Kawai, Isehara, JP;
Jiro Nakamura, Isehara, JP;
Assignees:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
4302701 ; 430326 ; 430905 ; 430910 ; 522 31 ; 522 59 ;
Abstract
A chemically amplified positive resist composition contains a novel trifluoromethanesulfonic or p-toluenesulfonic acid sulfonium salt having at least one tert-butoxycarbonylmethoxy group as an acid labile group. The composition is highly sensitive to high energy radiation, especially KrF excimer laser and has high sensitivity, resolution and plasma etching resistance while the resulting resist pattern is heat resistant.