The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 1997

Filed:

Jan. 16, 1997
Applicant:
Inventors:

John Edward Cronin, Milton, VT (US);

Carter Welling Kaanta, Colchester, VT (US);

Randy William Mann, Jericho, VT (US);

Darrell Meulemans, Jericho, VT (US);

Gordon Seth Starkey, Essex Junction, VT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01C / ; H01C / ; H01J / ;
U.S. Cl.
CPC ...
257506 ; 257752 ; 257900 ; 257903 ; 257915 ; 437187 ; 437235 ; 437236 ; 313512 ; 313306 ; 313309 ;
Abstract

A semiconductor structure comprising two gate stacks of equal height but different composition. The two gate stacks each comprise two layers, with the first layer of each gate stack comprising the same material and the second layer of each gate stack comprising a different material. Each gate stack has an upper surface a distance `X` above the upper planar surface of a substrate of the semiconductor structure. Thus, the two gate stacks of different composition are of identical height.


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