The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Feb. 27, 1995
Thekkemadathil Velayudhan Rajeevakumar, Scarsdale, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A trench structure for a high density trench DRAM cell is proposed. The proposed trench structure, which resides in part under the access device of the cell, does not require the use of expensive selective epi growth techniques. For the proposed cell, sub-minimum lithographic trench opening can be used (1) to improve the cell area, (2) to increase the device length, and (3) to improve the margin of diffusion strap. For the proposed cell structure, trench capacitance can be significantly increased without etching deeper trenches, or using thinner capacitor dielectric, by expanding the trench laterally under the device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile