The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 1997

Filed:

Aug. 26, 1992
Applicant:
Inventors:

Kenji Sugimoto, Shiga-ken, JP;

Tadashi Maegawa, Shiga-ken, JP;

Akihiko Hidaka, Shiga-ken, JP;

Toshio Hiroe, Shiga-ken, JP;

Hideki Hayashi, Shiga-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118423 ; 118428 ;
Abstract

For processing semiconductor substrates in a processing fluid, the substrates are introduced into a processing bath in which the processing fluid is filled. For holding the substrates in the process of introducing them into the processing bath, a holder having a pair of holding rods end a pair of aiding rods is prepared. A periodical linear array of grooves is formed on each rod. The rims of substrates are inserted into respective corresponding grooves on the rods so that the substrates do not touch respective side walls of the grooves in the aiding rod.


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