The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 1997

Filed:

Feb. 29, 1996
Applicant:
Inventors:

Timothy L Stuk, Lindenhurst, IL (US);

Michael S Allen, Silver Lake, WI (US);

Anthony R Haight, Mundelein, IL (US);

Howard E Morton, Gurnee, IL (US);

Daniel S Reno, Kenosha, WI (US);

Hing Leung Sham, Mundelein, IL (US);

Thomas J Sowin, Grayslake, IL (US);

Jien-Heh J Tien, Libertyville, IL (US);

Assignee:

Abbott Laboratories, Abbott Park, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ; C07D / ;
U.S. Cl.
CPC ...
560 24 ; 564164 ; 548469 ; 548491 ; 546 98 ;
Abstract

Intermediates and processes are disclosed which are useful for the preparation of a substantially pure compound of the formula: ##STR1## wherein R.sub.6 and R.sub.7 are each hydrogen or R.sub.6 and R.sub.7 are independently selected from ##STR2## wherein R.sub.a and R.sub.b are independently selected from hydrogen, loweralkyl and phenyl and R.sub.c, R.sub.d and R.sub.e are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and ##STR3## wherein the naphthyl ring is unsubstituted or substituted with one, two or three substitutents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or R.sub.6 is as defined above and R.sub.7 is R.sub.7a OC(O)-- wherein R.sub.7a is loweralkyl or benzyl; or R.sub.6 and R.sub.7 taken together with the nitrogen atom to which they are bonded are ##STR4## wherein R.sub.f, R.sub.g, R.sub.h and R.sub.i are independently selected from hydrogen, loweralkyl, alkoxy, halogen and trifluoromethyl and R.sub.8 is hydrogen or --C(O)R' wherein R' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.


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