The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 1997

Filed:

Oct. 04, 1995
Applicant:
Inventors:

Sergio Edelstein, Los Gatos, CA (US);

Nitin Khurana, Santa Clara, CA (US);

Keiji Miyamoto, Omigawa-machi, Katorigun, Chiba 289-03, JP;

Roderick C Mosely, Pleasanton, CA (US);

William J Murphy, Essex, VT (US);

Vijay Parkhe, Sunnyvale, CA (US);

James Van Gogh, Sunnyvale, CA (US);

Robert S West, Boulder Creek, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20429811 ;
Abstract

Sputtering apparatus and method suitable for forming a step coating on a workpiece. A workpiece is supported in a chamber, particles are emitted from a sputtering source, and the particles are passed through a collimating filter having a plurality of transmissive cells positioned between the sputtering source and the workpiece to limit the angles at which the particles can be deposited onto the workpiece. The collimating filter varies in height from a center portion to an outer portion while preferably maintaining a constant cell aspect ratio.


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