The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1997
Filed:
Mar. 02, 1995
Francisco A Leon, Mountain View, CA (US);
Satoshi Tazawa, Atsugi shi, Kanagawa 243, JP;
Gregory Anderson, Stanford, CA (US);
Other;
Abstract
A method for simulating changes to the topography of a workpiece, e.g. a semiconductor wafer, as it undergoes process steps. The method may be used to simulated isotropic or anisotropic deposition or etch process steps. A solids modeling system is used to define and deform material solids. Material solids represent the different materials on a workpiece. A plurality of trajectory solids are constructed to cause the deformation of the material solids. Deformation of a material solid is accomplished through the performance of boolean operations between the material solid and one or more trajectory solids. A characteristic of a trajectory solid, e.g. a radius or height, relates to the rate of etch or deposition for the particular process step. The method of construction of trajectory solids in the present invention enables simulation of spatially varying process steps, avoids the creation of invalid self-intersecting surfaces and minimizes the creation of small edges that lead to irregular surfaces.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile