The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 1997
Filed:
May. 05, 1993
Applicant:
Inventors:
Johann Bartha, Aidlingen-Dachtel, DE;
Johann Greschner, Pliezhausen, DE;
Karl H Probst, Kornwestheim, DE;
Gerhard Schmid, Leinfelden-Echterdingen, DE;
Assignee:
International Business Machines, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430323 ; 430314 ; 430317 ; 430313 ; 430324 ; 430329 ; 438948 ; 216 47 ; 216 18 ;
Abstract
A structure of openings is produced in two or more layers of silylated, polyimide photoresist. Openings in subsequent layers, which overlap previous openings, are of larger size. Then the structure is transferred to an organic substrate using oxygen plasma etching with up to 3% CF.sub.4. The smallest opening transferred to the substrate extends through the substrate.