The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1997
Filed:
Oct. 21, 1994
Tohru Ogawa, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A pattern projecting method is disclosed. The pattern projecting method has the step of illuminating a mask having a fine pattern formed therein with an exposure light and causing a transmitted light of the mask to be incident on a pupil of a projection optical system to project an image of the fine pattern onto a substrate, the illuminating step using an effective light source capable of achieving such light intensity distribution as to provide a predetermined light intensity in a central region of the pupil, a maximum light intensity in plural peripheral regions around the central region, and a light intensity lower than the maximum light intensity in a region connecting the plural regions.