The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1997
Filed:
Dec. 06, 1995
Applicant:
Inventors:
Toshiya Miyazaki, Osaka, JP;
Toshihiro Hayami, Osaka, JP;
Tadao Nakatsuka, Osaka, JP;
Hiroyuki Tanaka, Osaka, JP;
Toshiyuki Nakamura, Osaka, JP;
Assignee:
Sumitomo Metal Industries Limited, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ;
U.S. Cl.
CPC ...
216 60 ; 1566431 ; 216 59 ; 20429832 ; 356306 ; 356316 ; 438-9 ;
Abstract
A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.