The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1997
Filed:
Apr. 29, 1996
Peter Chew, Singapore, SG;
Chuck Jang, Singapore, SG;
Chartered Semiconductor Manufacturing Pte Ltd., Singapore, SG;
Abstract
A method for selectively depositing WSi.sub.x is described. Semiconductor device structures are provided in and on a semiconductor substrate wherein WSi.sub.x is to be deposited overlying a first portion of the substrate and wherein WSi.sub.x is not to be deposited overlying a second portion of the substrate. A layer of organic material is provided over the surface of the substrate overlying the second portion of the substrate. A layer of WSi.sub.x is deposited over the surface of the substrate wherein the WSi.sub.x is deposited overlying the first portion of the substrate and wherein the presence of the organic material layer prevents the WSi.sub.x from depositing overlying the second portion of the substrate completing the selective WSi.sub.x deposition in the fabrication of an integrated circuit device.