The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Mar. 15, 1996
Nikon Corporation, , JP;
Abstract
An exposure apparatus and an exposure method for fabricating semiconductor devices or liquid crystal display boards. The scanning means synchronously moves the mask and the photosensitive substrate with respect to the plurality of projection optical systems, and patterns formed on the mask are projected onto the photosensitive substrate while images of mask formed by adjacent illumination optical systems are made overlapping with each other. On this occasion, the controlling means controls the light intensity changing means, and the light intensity changing means changes the intensity of a light beam of each illumination optical system, so that two intensities of overlapping parts in adjacent illumination areas become substantially equal to each other. The control by the controlling means is carried out based on the light intensities of the overlapping illumination areas as detected by the light intensity detecting means.