The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1997
Filed:
Oct. 05, 1995
Konosuke Oishi, Mito, JP;
Toyoharu Okumoto, Hitachinaka, JP;
Masamichi Tsukada, Higashi, JP;
Takashi Iino, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma ion mass spectrometer capable of improving detection accuracy in mass spectrometry by reducing background noise due to ultraviolet radiation and neutral particles, and a plasma ion mass spectrometry using the same. A sample is ionized with plasma in a plasma generating portion. The flow of the ionized sample is shielded by a shield plate after an elapse of a specified time, and ions of the sample accumulated before the shielding is held in an ion trap type mass spectrometric portion for a specified time. The ions of the sample held for the specified time are then subjected to mass spectrometry. During ions of the sample accumulated before the shielding are held, ultraviolet radiation mixed with the ions of the sample disappears, and thereby only ions of the sample can be subjected to mass spectrometry. As a result, background noise is reduced, to improve detection accuracy in mass spectrometry.