The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 1997
Filed:
Feb. 15, 1995
Syouzou Watanabe, Moriguchi, JP;
Masaki Suzuki, Hirakata, JP;
Ichiro Nakayama, Kadoma, JP;
Tomohiro Okumura, Neyagawa, JP;
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
A vacuum plasma processing apparatus includes a vacuum processing container accommodating a to-be-processed substrate, a feeding device for feeding a reaction gas to the container, a vacuumizing device for discharging a gas in the container therefrom, a susceptor for holding the to-be-processed substrate arranged in the container, split electrodes arranged in a deltaic lattice at a wall surface of the container facing the to-be-processed substrate, and a power source unit for impressing to the slit electrodes three-phase RF powers having three phases different from each other. When the electrodes are arranged in an orthogonal lattice at the wall surface of the continuer, the power source unit impresses thereto two-phase RF powers having two phases different from each other.