The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1997
Filed:
Sep. 08, 1994
Damon K DeBusk, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and device is provided for removing a thin film from a wafer backside surface. The method and device advantageously removes the thin film without using photoresist masking material or the removal of photoresist material. The thin film at the wafer backside surface is removed without affecting any thin film material on the wafer front surface. As-such, the wafer backside surface is prepared for subsequent dopant ions used for extrinsic gettering of the backside surface. Alternatively, or in addition to dopants used for backside surface gettering, polysilicon can be deposited upon the exposed backside surface to enhance extrinsic gettering properties.