The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1997
Filed:
Sep. 15, 1995
Shuichi Kobayashi, Shirakawa, JP;
Masayuki Kobayashi, Fukushima-ken, JP;
Tsutomu Yuri, Livingston, GB;
Youichi Serizawa, Nishigo-mura, JP;
Mamoru Akimoto, Urawa, JP;
Shinichi Okoshi, Yamagata, JP;
Shin-Etsu Handotai Co., Ltd., , JP;
Abstract
A vertical wafer supporting boat is provided in which adequate reaction gas is supplied to the portion of a wafer surface to be treated which is inserted in holding grooves in members of the wafer supporting boat during the heat treatment and thus uniform heat treatment is achieved across the surface of each wafer. The particular groove shape preferably exploits the rotation of the boat in a vertical furnace to thereby uniformly supply the reaction gas on the entire surface to be treated of each of the wafers disposed in the boat. The holding grooves are inclined relative to a direction tangent to a wafer edge in order that the clearance facing the surface to be treated of a wafer is profiled to have an edge-like space by gradually increasing the width in the tangential direction of the wafer and, preferably, the internal groove surface opposed to the surface to be treated of the wafer is inclined to increase in width toward the center of the wafer.