The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1997
Filed:
May. 08, 1995
Applicant:
Inventors:
Leslie G Stanton, Simpsonville, SC (US);
Kenneth Krause, Clemson University, SC (US);
Assignee:
MEMC Electronic Materials, Inc., St. Peters, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ; G01N / ;
U.S. Cl.
CPC ...
356426 ; 356237 ; 356445 ; 356244 ; 2505594 ;
Abstract
Apparatus and method for the inspection of the edges of multiple semiconductor wafers at the same time. The wafers are held in a cassette and a columnar beam of light is projected tangentially to an upper edge portion of the wafers. Visual detection of back scattering of light from the edge of any of the wafers reveals the edge defect. Rotation of the wafers using the apparatus permits the entire circumference of the wafers to be inspected. The apparatus holds the wafers in such a way as to protect their polished surfaces during the inspection process.