The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 1996
Filed:
Jul. 20, 1994
Akira Makita, Tokyo, JP;
Osamu Nakamura, Tokyo, JP;
Takeshi Ikegami, Tokyo, JP;
Yasuhiko Ishii, Tokyo, JP;
Abstract
A method of producing an aperture grill of a CRT display device is disclosed. The aperture grill is of a small thickness of the order of 20 to 100 .mu.m. To a metal plate with front and rear surface resin layers are applied front slit pattern mask with a single broad slit pattern and a rear slit pattern mask with two adjacent, narrow slit patterns. With these two masks disposed in opposition, the slit patterns are printed and developed on the resist layers. Thereafter, etching is carried out on the rear surface of the metal plate via the rear resist layer, and rear cavities are formed in the metal plate. Then, a reinforcing, etchant-proof film is attached to the rear resist layer to cover the rear cavities, and thereafter etching is carried out on the front surface of the metal plate via the front resist layer, to thereby form a front cavity. As the front etching proceeds, the front cavity is caused to communicate with the rear cavities with the etchant flowing into the rear cavities, and the front and rear cavities are made into a single through slit. Thereafter the reinforcing film is removed. The method makes it possible to easily produce slits of dimensional accuracy.